LIN Research Group

Lab Facilities:

Fabrication: 

• Olympus series equipped with a 5-megapixel digital camera × 2

• Home-made 2D-staking Transfer platform × 2

• Pumping Station × 3

• Rapid Thermal Annealing

• Spin coater/hot-plate/ultrasonic cleaner

• Thermal evaporation​ with 2 boats

• UV-Ozone dry cleaner UV-1

• LED lithography

• JEOL IT 700HR equipped with RAITH ELPHY Quantum Lithography System​ (for lithography)

• JEOL JSM 7610F (for observations)

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Measurement: 

• Vigor Glovebox equipped with a room-temperature Probe station

• Lake Shore-Model TTPX Cryogenic Probe Station with vibration isolation (operation from 4.2 K to 475 K) × 2

• Keysight Precision SourceMeter

• Keysight High-Resistance Meter

• Keysight InfiniVision Oscilloscope

• Keysight Semiconductor Device Parameter Analyzer × 2 

• Noise Measuring System (1 Hz up to 10000 Hz)

• Tunable light-power sources (wavelength: 405, 520, 650, 780, 850 nm) ​​​​

 

Other Available Facilities:

• High-resolution E-beam Lithography Systems (Off-campus, Hsinchu City)

• Atomic Force Microscope​ (On-campus)​​

• Raman Spectrometer (On-campus)

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